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Sponsored by:
Editor-In-Chief:
ISSN 1002-2082
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Hosted By:
Published By: Journal of Applied Optics
CN 61-1171/O4
Material removal mechanism and influence factor of fluid jet polishing
MA Zhan-long;LIU Jian;WANG Jun-lin
Sponsored by:
Editor-In-Chief:
ISSN 1002-2082
Hosted By:
Published By: Journal of Applied Optics
CN 61-1171/O4
Material removal mechanism and influence factor of fluid jet polishing
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