Comparison of reactive magnetron and reactive ion-beamsputtering for deposition of silicon oxide thin film

ZHU Chang;MI Gao-yuan;DOSTANKO A P;GOLOSOV D A;ZAVATSKIY S M

CN Submission Journal Articles Figures Search
Adv. Search

  • Sponsored by:

    Editor-In-Chief:

    ISSN 1002-2082

    　

  • Hosted By:

    Published By: Journal of Applied Optics

    CN 61-1171/O4

Journal of Applied Optics ›› 2010, Vol. 31 ›› Issue (5) : 855-859.

Comparison of reactive magnetron and reactive ion-beamsputtering for deposition of silicon oxide thin film

    {{javascript:window.custom_author_en_index=0;}}
  • {{article.zuoZhe_EN}}
Author information +
History +

HeighLight

{{article.keyPoints_en}}

Abstract

{{article.zhaiyao_en}}

Key words

QR code of this article

Cite this article

EndNote

Ris (Procite)

Bibtex

Download Citations
{{article.zuoZheEn_L}}. {{article.title_en}}. {{journal.qiKanMingCheng_EN}}. 2010, 31(5): 855-859

References

Publishing order | Descend order by publishing year | Descend order by cited within

References

{{article.reference}}

Funding

RIGHTS & PERMISSIONS

{{article.copyrightStatement_en}}
{{article.copyrightLicense_en}}

Accesses

Citation

Detail
Sections
Recommended

/

〈 〉