聚焦慢速高荷态重离子束微束斑X射线源

应用光学 ›› 2004, Vol. 25 ›› Issue (1) : 5-8.

聚焦慢速高荷态重离子束微束斑X射线源

王凯歌,王雷,王鹏业,牛憨笨

作者信息 +

X-ray Source with Micro-beam Produced with Slow Highly Charged Ions

WANG Kai-ge,WANG Lei,WANG Beng-ye,NIU Han-ben

Author information +

文章历史 +

摘要

利用电子束离子源(EBIS)或者电子束离子陷阱(EBIT)产生的慢速高电荷态重离子束轰击金属靶面,离子束与靶面作用并复合辐射特征X射线;并将高荷态离子束采用离子光学系统会聚为微细束后再与靶面作用,能够辐射出微米甚至亚微米级、纳米级的微束斑X射线.本文介绍这一新型微束斑X射线源的结构、机理及其特性等.

Abstract

The electron beam ion trap(EBIT) and the electron ion source(EBIS) are new instruments for the study of X-ray produced by very highly-charged ions when they interact with free electrons. Some of the design and physics features of EBIT/EBIS are described, and the characters of the X-ray produced with them are described too. Micro-focal X-ray can be taken out if focusing the ion beam with the ion-optical system.

导出引用

王凯歌, 王雷, 王鹏业, 牛憨笨. 聚焦慢速高荷态重离子束微束斑X射线源. 应用光学. 2004, 25(1): 5-8

WANG Kai-ge, WANG Lei, WANG Beng-ye, NIU Han-ben. X-ray Source with Micro-beam Produced with Slow Highly Charged Ions. Journal of Applied Optics. 2004, 25(1): 5-8

Accesses

Citation

Detail

段落导航

摘要
Abstract
关键词
Key words
引用本文

选择文件类型/文献管理软件名称

选择包含的内容

摘要

Abstract

关键词

Key words

引用本文

{{custom_sec.title}}

{{custom_sec.title}}

{{custom_fnGroup.title_cn}}

脚注

出版日期
2004-01-15
发布日期
2004-01-15

模态框（Modal）标题

选择文件类型/文献管理软件名称

选择包含的内容

摘要

Abstract

关键词

Key words

引用本文

{{custom_sec.title}}

{{custom_sec.title}}

{{custom_fnGroup.title_cn}}

脚注