活性破片高速撞击产生等离子体的毁伤效应

徐瑞泽;肖建光;马俊杨;安德隆;谢志渊;王岩鑫

兵工学报 ›› 2023, Vol. 44 ›› Issue (12) : 3733-3742.

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  • 主管：中国科学技术协会

    主编：许毅达

    ISSN 1000-1093

    　

  • 主办：中国兵工学会

    出版：《兵工学报》 编辑部

    CN 11-2176/TJ

《兵工学报》是我国国防科技领域最具影响力的学术期刊之一，创刊于1979年，目前被国内所有重要数据库收录，其综合评价指标近年来一直名列兵工技术类科技期刊的首位；《兵工学报》目前还被国际上著名的检索机构美国......
兵工学报 ›› 2023, Vol. 44 ›› Issue (12) : 3733-3742. DOI: 10.12382/bgxb.2023.0048
论文

活性破片高速撞击产生等离子体的毁伤效应

  • 徐瑞泽1， 肖建光1,2*()， 马俊杨1， 安德隆1， 谢志渊1， 王岩鑫1
作者信息 +

Damage Effect of Plasma Produced by High-velocity Impact of Reactive Fragments

  • XU Ruize1， XIAO Jianguang1,2*， MA Junyang1， AN Delong1， XIE Zhiyuan1， WANG Yanxin1
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文章历史 +

摘要

为探究活性破片高速撞击产生等离子体特性及其对目标造成的电磁毁伤效应，开展了活性破片高速撞击铝板的毁伤试验。采用不同配方活性材料破片和普通铝制破片分别撞击铝板，通过朗缪尔三探针系统获得活性和惰性破片在特定空间位置产生等离子体的电子密度和电子温度，通过逻辑芯片信号采集系统获得74HC04逻辑芯片在等离子体作用下的电磁毁伤效应。研究结果表明：由于活性破片独特的侵爆效应，释放出更多的能量，使得产生的等离子体电子密度比惰性破片更高；配方为钽＼镁＼四氟乙烯-六氟丙烯-偏氟乙烯共聚物(Ta/Mg/THV，70%Ta+9.26%Mg+20.74%THV)的活性破片以1.4 km/s的速度撞击厚度为2 mm的双层铝板时，产生的等离子体电子密度能达到5.89×1015 m-3，对74HC04逻辑芯片造成了逻辑关系短暂失真的瞬态软毁伤和逻辑工作能力完全失效的不可逆毁伤。

Abstract

The damage test of reactive fragments hitting aluminum plate at high speed is carried out to investigate the plasma characteristics and the electromagnetic damage effect on target caused by high-speed impact of reactive fragments. The reactive material fragments of different formulas and ordinary aluminum fragment are used to impact the aluminum plate. The electron density and temperature of plasma generated from thereactive and inert fragments at specific spatial location were obtained by usingatriple Langmuir probe system. The electromagnetic damage effect of 74HC04 logic chip under the action of plasma was obtained by usinga logic chip signal-acquisition system. The results show that the plasma electron density produced by the reactive fragments is higher than that produced by the inert fragments due to the unique penetration effect of the reactive fragments and the release of more energy. When the reactive fragment containingtantalum/magnesium/tetrafluoroethylene-hexafluoropropylene-vinylidene fluoride copolymer(Ta/Mg/THV,70%Ta+9.26%Mg+20.74%THV) impact the double aluminum plates with 2 mm thickness at the speed of 1.4 km/s, the plasma electron density can reach 5.89×1015 m-3, andit also causes thetransient soft damage with transient distortion of logic relation and theirreversible damage with complete failure of logic working ability to the 74HC04 logic-chip.

关键词

活性破片 / 高速碰撞 / 等离子体 / 逻辑芯片 / 电磁毁伤

Key words

reactivefragment / highspeedimpact / plasma / logicchip / electromagneticdamage

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徐瑞泽，肖建光，马俊杨，安德隆，谢志渊，王岩鑫. 活性破片高速撞击产生等离子体的毁伤效应. 兵工学报. 2023, 44(12): 3733-3742 https://doi.org/10.12382/bgxb.2023.0048
XU Ruize， XIAO Jianguang， MA Junyang， AN Delong， XIE Zhiyuan， WANG Yanxin. Damage Effect of Plasma Produced by High-velocity Impact of Reactive Fragments. Acta Armamentarii. 2023, 44(12): 3733-3742 https://doi.org/10.12382/bgxb.2023.0048

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