高分辨率电子工业用数字化X射线检测系统

李伟

应用光学 ›› 2012, Vol. 33 ›› Issue (4) : 654-659.

应用光学 ›› 2012, Vol. 33 ›› Issue (4) : 654-659.

高分辨率电子工业用数字化X射线检测系统

  • 李伟
作者信息 +

High-resolution X-ray digital radiography of electronic industry

  • LI Wei
Author information +
文章历史 +

摘要

提出一种高分辨率电子工业用数字化X射线检测系统的总体设计方案,选择微焦斑X射线源和双近贴式X射线像增强器作为该系统的关键器件,分析了微焦斑X射线源的焦斑尺寸对系统分辨率的影响,并且建立了微焦斑X射线源和双近贴式X射线像增强器自身分辨率及成像的几何放大率对系统最终分辨率影响的数学模型。通过数学模型得出了几何放大率同系统分辨率的关系曲线。设计了光路及图像采集装置,并用VC 6.0完成了实用的X射线图像处理软件,研制了完整的成像系统样机并进行了调试与实验。这种成像系统有效视野可达75 mm,分辨率为160 lp/cm。

Abstract

This paper introduced a design of high-resolution digital X-ray detection system used in electronic industry. According to the requirement of the design, this paper put forward the overall scheme of the system,researched and selected the micro-focal spot X-ray source and double proximity focusing X-ray intensifier as the key devices in the system, analyzed the influence on the final resolution caused by their own resolution of micro-focal spot X-ray source, double proximity X-ray intensifier and the system magnification. It designed the light path, image acquisition device and acquisition software, developed a complete imaging system prototype, and carried out debugging and experiment on it ,then completed the practical X-ray image processing software by using VC 6.0. Results show that the effective vision of this imaging system achieves up to 75 mm, and the resolution is 160 lp/cm.

关键词

双近贴式X射线像增强器 / 分辨率 / 数字化成像 / 微焦斑X射线源

Key words

micro-focus X-ray source / digital imaging / resolution / double proximity focusing X-ray image intensifier

引用本文

导出引用
李伟. 高分辨率电子工业用数字化X射线检测系统. 应用光学. 2012, 33(4): 654-659
LI Wei. High-resolution X-ray digital radiography of electronic industry. Journal of Applied Optics. 2012, 33(4): 654-659

参考文献

[1]李伟,赵宝升,张兴华,等.双近贴式X射线像增强器成像系统的三维噪声测量及分析技术[J].光子学报, 2009, 38(8):1932-1936.
LI Wei, ZHAO Bao-sheng, ZHANG Xing-hua, et al. 3-D noise measurement and analysis for a double proximity focusing X-ray image intensifier radiography imaging system[J]. Acta Photonica Sinica, 2009, 38(8): 1932-1936.(in Chinese with an English abstract)
[2]李伟,赵宝升,赵菲菲,等. 双近贴式X射线像增强器成像不均匀性的分析与校正[J].光子学报,2009, 38(6): 1353-1357.
LI Wei, ZHAO Bao-sheng, ZHAO Fei-fei, et al. Analysis and correction for nonuniformity of the two side proximity of X-ray image intensifier radiography[J]. Acta Photonica Sinica, 2009, 38(6): 1353-1357. (in Chinese with an English abstract)
[3]潘俊杰,赵宝升,赛小峰,等. 影响X射线像增强器分辨率的因素分析[J]. 光子学报,2008, 37(6):1116-1118.

Accesses

Citation

Detail

段落导航
相关文章

/