Study on the Wet Oxidation Process in 808nm VCSEL

HOU Li-feng;ZHONG Jing-chang;SUN Fu;ZHAO Ying-jie;HAO

Acta Armamentarii ›› 2010, Vol. 31 ›› Issue (2) : 209-213. DOI: 10.3969/j.issn.1000-1093.2010.02.015
Paper

Study on the Wet Oxidation Process in 808nm VCSEL

  • HOU Li-feng1,2, ZHONG Jing-chang1, SUN Fu2, ZHAO Ying-jie1, HAO
Author information +
History +

Abstract

Wet oxidation experiments of the samples were carried out in order to improve th

Key words

semiconductor technique / vertical-cavity surface-emitting laser / wet oxidation / oxide-aperture

Cite this article

Download Citations
HOU Li-feng, ZHONG Jing-chang1, SUN Fu2, ZHAO Ying-jie1, HAO. Study on the Wet Oxidation Process in 808nm VCSEL. Acta Armamentarii. 2010, 31(2): 209-213 https://doi.org/10.3969/j.issn.1000-1093.2010.02.015

References

[1] JungC, King R, Jger R, et al. 64 channel flip-chip mounte
d selectively oxidized GaAs VCSEL array for parallel optical interconnects[C]
. On Vertical-Cavity Surface-Emitting Lasers Ⅲ. SPIE. 1999, 3627: 143-151.
[2] OsinskiM, Svimonishvili T, Smolyakov G A, et al. Temperature and thi
ckness dependence of steam oxidation of AlAs in cylindrical mesa structures[J]
. IEEE Photon Technol Lett, 2001, 13(7): 687-689.
[3] 李惠青,张杰,崔大复,等. 高功率垂直腔面发射半导体激光器优化设计研究
[J]. 物理学报, 2004,53(9):2986-2990.
LI Hui-qing, ZHANG Jie, CUI Da-fu, et al. Optimal designs for high-power vert
ical cavity surface emitting lasers[J]. Acta Physica Sinica, 2004,53(9): 2986-
2990. (in Chinese)
[4] 郝永芹,刘文莉,钟景昌,等. 垂直腔面发射激光器中的新结构研究[J].
兵工学报,2007,28(2):167-169.
HAO Yong-qin, LIU Wen-li, ZHONG Jing-chang, et al. A new structure for vertic
al-cavity surface emitting laser[J]. Acta Armamentarii, 2007,28(2): 167-169
. (in Chinese)
[5] 康香宁, 宋国峰, 叶晓军,等. 高铝AlxGa1-xAs氧化层对
垂直腔面发射激光器的影响[J].半导体学报,2004,25(5): 589-593.
KANG Xiang-ning, SONG Guo-feng, YE Xiao-jun, et al. Effect of high aluminum A
lGaAs oxidized layers on vertical-cavity surface-emitting lasers[J]. Journal
of Semiconductors, 2004, 25(5): 589-593. (in Chinese)
[6] LearK L, Choquette K D, Schneider R P. Selectively oxidized vertical
cavity surface emitting lasers with 50% power conversion efficiency[J]. Elect
ron Lett, 1995, 31(3): 208-210.
[7] DasN C, Newman P. Effect of post oxidation annealing on VCSEL perfor
mance[J]. Solid-State Electronics, 2003, 47(8): 1359-1362.
[8] 赵英杰,刘文莉,郝永芹,等. VCSEL氧化物限制工艺研究[J].长春理工大
学学报,2004,27(1):56-58.
ZHAO Ying-jie, LIU Wen-li, HAO Yong-qin, et al. Study on oxidation confinemen
t process of vertical-cavity surface-emitting lasers[J]. Journal of Changchu
n University of Science and Technolony, 2004, 27(1): 56-58. (in Chinese)
[9] AshbyGl H, Bridges M M, Allerman A A, et al. Origin of the time depe
ndence of wet oxidation of AlGaAs[J]. Appl Phys Lett, 1999, 75(1): 73-75.
[10] OchiaiM, Giudice G E, Temkin H, et al. Kinetics of thermal
oxidation of AlAs in water vapor[J]. Appl Phys Lett, 1996, 68(14): 1898-1900.
[11] LIRuo-yuan, WANG Zhang-uo, XU Bo, et al. Wet oxidation of AlGaAs/
GaAs distributed bragg reflectors[J]. Chinese Journal of Semiconductors,2005,2
6(8):1519-1523.

389

Accesses

0

Citation

Detail

Sections
Recommended

/